Costa-Rica Spherical tantalum powder

Tantalum powder is a dark gray or silver-gray metallic powder characterized by a high density (approximately 16.6 g/cm³), a high melting point (2996°C), and a high boiling point (approximately 5500°C). It has stable chemical properties, excellent corrosion resistance at room temperature, is insoluble in water, and is difficult to dissolve in inorganic acids.

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Costa-Rica3D Printing Metal Powder Series

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Product Description

Product Overview:

Tantalum powder is a dark gray or silver-gray metallic powder with high density (about 16.6g/cm³), high melting point (2996℃), and high boiling point (about 5500℃). It has stable chemical properties, excellent corrosion resistance at room temperature, is insoluble in water, and difficult to dissolve in inorganic acids.

Tantalum powder has a wide range of applications. In the electronics field, it can be used to manufacture high-quality electrolytic capacitors and other electronic components; in the metallurgy industry, it is an important raw material for preparing various tantalum materials or as an alloy additive, used to produce high melting point, high strength, and good ductility alloys; in the chemical industry, it can be used to manufacture various important parts in chemical equipment; in the aerospace field, it can be used in the manufacturing of space vehicles and other equipment.

Our spherical tantalum powder is high purity, low oxygen, high sphericity, smooth surface, free of satellite spheres, and has a uniform particle size distribution, exhibiting excellent flowability as well as high bulk density and tapped density. Tantalum has excellent biocompatibility, and tantalum implants formed by 3D printing have an elastic modulus similar to that of human cartilage tissue, making it an ideal orthopedic implant material. Spherical tantalum powder is suitable for laser/electron beam additive manufacturing, hot isostatic pressing, laser cladding, thermal/cold spraying, and other processes.

Available conventional powder particle sizes: 5-25μm, 15-53μm, 45-106μm, 53-150μm.

Product Parameters:

Chemical Composition
Element	Content (wt%)	Testing Method		Element	Content (wt%)	Testing Method
Ta	>=99.95	-		Ti	<0.001	ICP-AES
Fe	<0.001	ICP-AES		Mo	<0.001	ICP-AES
Si	<0.005	ICP-AES		W	<0.01	ICP-AES
Ni	<0.002	ICP-AES		Nb	<0.01	ICP-AES
Gas Impurities
Element	Content (wt%)	Testing Standards		Element	Content (wt%)	Testing Standards
C	≤0.003	GB/T 15076.8-2008		0	≤0.03	GB/T 15076.14-2008
N	≤0.0025	GB/T 15076.15-2008		N	≤0.004	GB/T 15076.13-2017
Density (g/cm³)					Hall Flow Rate (s/50g)
Apparent Density		Tapped Density	Testing Standards		Value	Testing Standards
>=9.5		>=10.5	GB/T 1479-1984 GB/T 5162-2006		≤6.5	GB/T 1482-2010