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Spherical hafnium powder

Hafnium powder is a shiny hexagonal gray crystal with a melting point of 2227°C, a density of 13.31, and a boiling point of 4602°C. It is soluble in hydrofluoric acid, aqua regia, and concentrated sulfuric acid. Its powdered form is chemically reactive and can undergo oxidation reactions or even spontaneous combustion when exposed to air. There is a risk of combustion and explosion when it comes into contact with open flames, high heat, or oxidizers, and it can react violently with elements such as fluorine and chlorine.
  • Commodity name: Spherical hafnium powder

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  • Product Description
  • Product Overview:

     

    Hafnium powder is a shiny hexagonal gray crystal with a melting point of 2227℃, a density of 13.31, a boiling point of 4602℃, and is soluble in hydrofluoric acid, aqua regia, and concentrated sulfuric acid. Its powdered form has high chemical reactivity, and it undergoes oxidation reactions or even spontaneous combustion when exposed to air. It poses a combustion and explosion hazard when in contact with open flames, high heat, or oxidizers, and can react violently with fluorine, chlorine, and other substances.

    Hafnium powder is mainly used to make control rods for atomic reactors, as well as for deoxidizers and additives in hard alloys. It can also be used in the manufacture of rocket thrusters, cathodes for X-ray tubes, rocket nozzles, and leading edge protection layers for aircraft, and serves as an additive in heat-resistant alloys, as well as a gas absorbent in inflating systems and an additive in hydraulic oils.

    Our company's spherical hafnium powder features high purity, good sphericity, no satellite particles, and very few hollow particles, making it suitable for 3D printing, hot isostatic pressing, laser cladding, and other processes.

    Available conventional powder particle sizes: 5-25μm, 15-53μm, 45-106μm, 53-150μm.

    Product Parameters:

    Chemical Composition

    Element

    Content (wt%)

    Testing Method

    Element

    Content (wt%)

    Testing Method

    Hf

    ≥99.8

    -

    Si

    <0.005

    ICP-AES

    Al

    ≤0.01

    ICP-AES

    Nb

    <0.01

    ICP-AES

    W

    <0.005

    ICP-AES

    Fe

    <0.01

    ICP-AES

    Zr

    <0.5

    ICP-AES

    Other

    <0.05

    -

    Gas Impurities

    Element

    Content (wt%)

    Testing Standards

    Element

    Content (wt%)

    Testing Standards

    O

    <0.2

    YS/T 1467.10-2021

    N

    ≤0.05

    YS/T 1467.10-2021

    Density (g/cm³)

    Hall Flow Rate (s/50g)

    Apparent Density

    Tapped Density

    Testing Standards

    Value

    Testing Standards

    ≥6.5

    ≥7.5

    GB/T1479-1984

    GB/T 5162-2006

    ≤10.0

    GB/T1482-2010

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